研究者詳細

顔写真

カンノ　モリユキ
菅野　杜之
Moriyuki Kanno
所属
多元物質科学研究所　計測研究部門　量子光エレクトロニクス研究分野
職名
助教
学位

  • 博士（科学）（東京大学）

  • 修士（科学）（東京大学）

e-Rad 研究者番号
00981945

学歴 1

  • 東京大学　大学院新領域創成科学研究科　物質系専攻

    2019年4月 ～ 2022年3月

論文 11

  1. Rapid ambient direct growth of HKUST-1 via atmospheric pressure plasma treatment 査読有り

    Moriyuki Kanno, Tsuyohito Ito, Itaru Honma, Kazuo Terashima

    Materials Horizons　2026年4月

    DOI： 10.1039/D6MH00065G 　

  2. Solvent-free processing of lithium-ion batteries via plasma treatment of electrodes for adhesive interfaces 査読有り

    Moriyuki Kanno, Itaru Honma

    Journal of Energy Storage　137　118658　2025年11月

    DOI： 10.1016/j.est.2025.118658 　

  3. Data-Driven Exploration of Critical Factors for Single-Phase High-Entropy Oxide Anode Materials 査読有り

    Moriyuki Kanno, Toshiaki Taniike, Itaru Honma

    JOURNAL OF PHYSICAL CHEMISTRY LETTERS　16　(37)　9824-9829　2025年9月18日

    DOI： 10.1021/acs.jpclett.5c02225 　

    ISSN：1948-7185

  4. In situ separation of plasma-generated species using metal–organic frameworks 査読有り

    Kyotaro Takagi, Moriyuki Kanno, Hitoshi Muneoka, Kazuo Terashima, Tsuyohito Ito

    Applied Physics Letters　2024年3月18日

    DOI： 10.1063/5.0196178 　

  5. HKUST-1 formation in solution influenced by laser-induced plasma at the early stage 査読有り

    Shota Chiba, Moriyuki Kanno, Hitoshi Muneoka, Tsuyohito Ito, Kazuo Terashima

    Japanese Journal of Applied Physics　2024年3月1日

    DOI： 10.35848/1347-4065/ad272a 　

  6. Application of the hard‐soft acid–base principle in plasma‐in‐liquid processing 査読有り

    Moriyuki Kanno, Tsuyohito Ito, Kazuo Terashima

    Plasma Processes and Polymers　2023年12月11日

    出版者・発行元： Wiley

    DOI： 10.1002/ppap.202300156 　

    ISSN：1612-8850

    eISSN：1612-8869

    詳細を見る 詳細を閉じる

    Abstract Plasma, owing to its reactivity and nonequilibrium properties, is a unique field commonly used in material processing. In recent years, plasma processing with a liquid phase has attracted considerable attention owing to its important advantages, such as high electron density and the availability of a wide variety of reactions in solutions. However, plasma‐in‐liquid material synthesis is occasionally difficult to control and guidelines are lacking. In this study, we investigated whether the hard‐soft acid–base (HSAB) principle, which is often applied in material synthesis, is applicable to the plasma‐in‐liquid process and demonstrated that organic solvent‐derived substances produced by plasma‐in‐liquid processing reacted with solutes according to the HSAB principle. These results suggest that the HSAB principle may apply to plasma‐in‐liquid processing.

  7. Cuboid Cu(HBTC)(H2O)(3) synthesis via plasma pretreatment of trimesic acid solution 査読有り

    Moriyuki Kanno, Tsuyohito Ito, Yoshiki Shimizu, Kazuo Terashima

    PLASMA PROCESSES AND POLYMERS　18　(9)　2021年9月

    DOI： 10.1002/ppap.202100047 　

    ISSN：1612-8850

    eISSN：1612-8869

  8. Synthesis of a metal-organic framework by plasma in liquid to increase reduced metal ions and enhance water stability 査読有り

    Moriyuki Kanno, Takashi Kitao, Tsuyohito Ito, Kazuo Terashima

    RSC ADVANCES　11　(37)　22756-22760　2021年7月

    DOI： 10.1039/d1ra00942g 　

    eISSN：2046-2069

  9. Communication-Development of Discharge-Assisted Electrophoretic Deposition and Demonstration for TiN Deposition 査読有り

    Moriyuki Kanno, Tsuyohito Ito, Kazuo Terashima

    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY　10　(6)　2021年6月

    DOI： 10.1149/2162-8777/ac07ff 　

    ISSN：2162-8769

    eISSN：2162-8777

  10. Generation of field-emitting surface dielectric barrier discharges in Ar and N-2 査読有り

    Moriyuki Kanno, Ryo Tanaka, Sven Stauss, Tsuyohito Ito, Kazuo Terashima

    AIP ADVANCES　9　(5)　2019年5月

    DOI： 10.1063/1.5093960 　

    ISSN：2158-3226

  11. Generation and characterization of field-emitting surface dielectric barrier discharges in liquids 査読有り

    Tomohisa Kawamura, Moriyuki Kanno, Sven Stauss, Koichi Kuribara, David Z. Pai, Tsuyohito Ito, Kazuo Terashima

    JOURNAL OF APPLIED PHYSICS　123　(4)　2018年1月

    DOI： 10.1063/1.5011445 　

    ISSN：0021-8979

    eISSN：1089-7550

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